CNS Enabled Technologies

  • Nanoscale Magnetic Sensors

  • Environmental SEM

  • Biological and Biomaterials Imaging

  • Atomic Resolution TEM Imaging

  • Injectable Self-assembling Inorganic Scaffolds

  • Linear and Nonlinear Confocal Microscopy

  • 25nm Field Effect Transistor

  • Quantum Dot Structures

  • Complex Microfluidic Systems

  • Single Electron Transistor

  • SiO2 Corkscrew Stuctures

  • Nanowire Transistor

  • NanoPhotonic Resonators

  • Diamond NanoPhotonics

  • Complex MEMs Arrays

  • GaN Nanodisks

  • Q-Dot Device

CNS Core Mission

The Center for Nanoscale Systems (CNS) was created to support a very clear visionThe development of a collaborative multi-disciplinary research environment to support of the creation and evolution of world-class nanoscience with the support of advanced shared facilities and technical expertise.  This center serves both the Harvard research community, as well as external researchers from academia and industry. 

Our Core Values:

  • Facilitating leading-edge, multi-disciplinary, research and education in the areas of fabrication, imaging, and characterization of nanoscale structures, across the disciplines of applied physics, biology, chemistry,  engineering, geology, materials science, medicine and physics.

  • Creating a leading collaborative nanotechnology research community by providing shared instrumentation facilities and infrastructure, expert staff, synergistic meeting places, and educational opportunities conducive to productive scientific engagement.

CNS strives to provide world-class tools for world-class research, fostering a strong competitive edge for our nation’s investigators.  We serve a broad, diverse, national set of users who are preparing the nation to meet the needs of next generation technologies.

Latest News

New Nanoscribe 3D Printing System Online!

May 19, 2015
New Nanoscribe 3D Printing System Online!

A New 3D Laser Lithography capability at CNS: The Nanoscribe Photonic Professional GT

The new generation of Nanoscribe´s 3D laser lithography systems, Photonic Professional GT, provide a fast and powerful platform for 3D micro- and nanofabrication demands.  Almost and arbitrarily defined complex polymer structures can be fabricated with feature sizes in the sub-micrometer range achieved by means of two-photon polymerization.  A tremendous speed-up of the writing process is driven by an embedded ultra-high precision galvo technology, which laterally deflects the laser focus position by use of a galvanic mirror system. Thus, the fabrication of large area 3D micro- and nanostructures is now feasible in shortest time. In addition to rapid x-y-beam-scanning, a piezoelectric scanning stage provides ultra-precise x-y-z-movements of the substrate relative to the laser focus position - a proven feature retained from the Photonic Professional basic unit. Speed, precision and extraordinary resolution prove these 3D printers to serve as disruptive enablers for novel applications. The table-top laser lithography systems are fully automated. An intuitive, userfriendly software as integral part of an innovative workflow eases demanding tasks and secures their successful completion. Structures can either be designed in 3D printer compatible CAD software programs or directly implemented in Nanoscribe´s GWL scripting language. The software package features a fast interactive 3D preview of the printing output.

 Key Attributes

  • Highest resolution commercially available 3D printer
  • Fast and accurate by galvo and piezo technology
  • Easy fabrication of 3D micro- and nanostructures
  • Two-photon polymerization of various UV-curable photoresists
  • Writing area up to the centimeter range
  • User-friendly software package
  • Easy CAD import via DXF, STL file format


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